Thermal Evaporation Systems
E-Beam Evaporation Systems
ATC-IM Ion Milling Systems are versatile tools which are built in a variety of configurations depending on the specific requirement. Chambers can be either cylindrical or box style and either HV or UHV. SIMS endpoint detection is optional along with AJA's unique SIMS-IS isolation system which allows the SIMS head/detector to be kept under vacuum whenever the main chamber is vented. Systems can include computer control, load-lock, auto-loading, a multi-substrate cassette and mask exchange.
a wide variety of available substrate holders with features such as rotation, manual/motorized incident angle adjustment, heating, water cooling, LN2 cooling, backside gas cooling, and electrical isolation or biasing.
These systems can be configured for a broad range of applications ranging from nano pattern delineation to bulk wafer planarization. AJA manufactures or incorporates either gridless or gridded, RF or DC ion sources, with appropriate grid materials and curvatures for the requirement. Systems have been manufactured to employ both inert and reactive/corrosive process gases with the appropriate safety gas box included on the equipment.
SVT Associates' SMART (Scientific Materials and Applied Research Tool) Pulsed Laser Deposition System is a unique versatile research tool. Combining pulsed a Laser Ablation system with other deposition techniques, SVT Associates' PLD system offers a broad range of materials and applications. The ability to extend the vacuum capabilities to Ultra High Vacuum base pressures allows the control of unwanted film impurities.
The laser target manipulator accommodates up to six 1" diameter targets (or four 2") in vacuum which are selectable through the controlling computer. Each of the individual targets can be rotated about its axis, which together with the laser scanning provides a uniform erosion of the target. Using this flexibility, a multitude of thin film structures is possible.
Several laser options are available through SVT Associates depending on the application requirements and budget. Optional in-situ monitoring tools such as RHEED provide you with process feedback in Laser MBE. Available load lock sample handling allows the SMART system to interface with other deposition or metrology tools without exposure of the sample to the atmosphere.
For oxide film deposition, to help ensure complete oxidation, the "High Pressure Oxygen Deposition Package" allows you to set up a partial pressure of O2 in chamber during deposition. Substrate heaters and differential pumping of RHEED electron gun for use in oxygen are also available options.
Molecular Beam Epitaxy (MBE) is a key technology due to the unique structures and exact dimensional control that can be achieved.
The SVT Associates, Inc. MBE System is a high performance tool which can be configured for a wide range of material applications. SVTA manufactures the MBE systems, deposition sources, and the essential process monitors. SVTA has full growth process knowledge from our experience in our own laboratory and the previous experience of our staff. This integration results in excellent control over quality and cost, to offer the most cost effective tool available for MBE.
SVTA MBE systems offer an ultra-pure environment for precision fabrication of thin film structures for semiconductor, opto-electronic, photovoltaic, and magnetic applications. SVTA MBE Equipment is specially designed for the materials they produce. The MBE Systems are equipped with hardware and software capabilities to monitor, display, and control critical growth parameters.
SVTA Systems are designed around a modular configuration consisting of several functional units. The modular system concept is a flexible and reliable way of adapting to different customer needs. Typically, there are at least two separate modules, one for the deposition process and one for wafer loading/sample preparation. There are other processing modules, such as cluster tool or material analysis modules that may be added depending on the customer needs. Systems with multiple growth modules for “incompatible” materials are available. Each module has its own independent UHV pumping system and can be isolated from other modules by gate valves. This arrangement makes it possible to perform various system functions independently and concurrently: substrate loading, sample treatment, film growth, and sample analysis.
Our LPCVD systems can uniformly deposit many thin film materials, including wide bandgap semiconductors, silicon carbide (SiC), nitrides, oxides, poly and epi silicon, transparent conductive oxides (TCOs), graphene, Si/SiGe epitaxial films, metallic and ceramic films, etc. The LPCVD systems are also used for nanomaterials synthesis including carbon nanotubes, graphene, semiconducting nanowires, and 2D crystals including boron nitride and molybdenum disulfide. LPCVD coatings typically exhibit excellent uniformity, high purity, and good step coverage.
We apply different vacuum system technologies depending on the requirements of the process. Vacuum systems are selected based on the types of chemistries involved and process pressure requirements. Our vacuum system solutions are designed to be low maintenance, robust, and reliable. Vacuum systems are integrated into a central control and safety system.
Plasma enhanced chemical vapor deposition (PECVD) (also referred to as plasma assisted, PACVD) is a process technology whereby the activation energy for the CVD reaction to occur is achieved not just by temperature, but also by an energetic plasma formed in an electric (DC or RF) field. PECVD is commonly used in situations where the substrate or deposited films have a low thermal budget and would otherwise suffer from degradation if subjected to the higher temperatures required by thermal CVD. By varying the plasma we can add additional control to the properties of the deposited film.
PECVD is required for the fabrication of many semiconductor devices. It is also used for industrial coatings where the benefits of CVD are required (conformity, high density, high purity, uniformity) but where the substrate or deposited layers cannot be subjected to high temperatures.
Metal organic chemical vapor deposition (MOCVD) is a process used for creating high purity crystalline compound semiconducting thin films and micro/nano structures. Precision fine tuning, abrupt interfaces, epitaxial deposition, and a high level of dopant control can be readily achieved. It is widely adopted in R&D and industry for advanced optoelectronics, high power and high speed electronics applications.
The FirstNano® EasyTube® platform of CVD systems can be configured for Metal organic chemical vapor deposition (MOCVD) processing for a range of substrate sizes. Options include liquid or solid metal organic precursor delivery, gas injectors / showerhead, wafer rotation, hot wall or cold wall processing, vacuum control, and exhaust scrubbing. CVD Equipment Corporation recognizes the stringent demands on processing tools that are required in order to maintain controllable and repeatable deposition of high quality, high purity crystal structures and epi layers. It is with our >32 years of experience that we have developed a modular platform for MOCVD that is tried and tested, with multiple systems in operation worldwide.
MOCVD is widely adopted in the semiconductor industry. Devices that benefit from this technology include lasers and LEDs, solar cells, and field effect transistors (FETs). MOCVD allows for high volume production of bandgap engineered semiconducting heterostructures. MOCVD can also be used for the controlled production of 0D, 1D and 2D nanomaterials.